High Resolution X-Ray Diffraction in Multilayered Semiconductor Structures and Superlattices
High Resolution X-Ray Diffraction in Multilayered Semiconductor Structures and Superlattices
复制标题
多层半导体结构和超晶格中的高分辨率 X 射线衍射
DOI：
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发表时间：
1989
期刊：
影响因子：
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通讯作者：
L. Tapfer
中科院分区：
文献类型：
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作者：
L. Tapfer
层状结构的x射线衍射图提供了其结构参数的详细信息，如应变剖面、化学成分、层厚和界面质量。还可以确定超流体的周期、各层厚度、组成和均匀性的任何变化。然而，为了准确地确定结构特性，需要对实验衍射模式进行理论建模。本文对多层材料中x射线散射的动力学模型和运动学模型进行了评述和比较：动力学模型只给出了x射线散射的刚性描述。通过对AlxGa1-xAs/GaAs和GaxIn1-xAs/AlyIn1-y As材料体系的研究，说明了x射线衍射技术分析多层结构的独特能力。讨论了x射线在周期系统、准周期系统（斐波那契超晶格）、自动系统（Theu-Morse超晶格）以及随机系统上的散射。
X-ray diffraction patterns from layered structures yield detailed information on their structural parameters such as strain profile, chemical composition, layer thickness and interface quality. Any variation of the period, thickness of the individual layers, composition and homogeneity of the supelattics can be also determined. For an accurate determination of the structural properties a theoretical modeling of the experimental diffraction patters is, however, requird. The appropriate dynamical and kinematical models of x-ray scatting on multilayers are here reviewed and compared: The dynamical model gives only a rigotions description of the x-ray scattering. The unique capability of the x-ray diffraction technique to analyze multilayer structures is illustrated by investigations of the AlxGa1-xAs/GaAs and GaxIn1-xAs/AlyIn1-y As material systems. X-ray scattering on periodic, quasiperiodic (Fibonacci superlattics), automatic (Theu-Morse superlattics), as well as on random systems is discussed.