Synthesis of hydrogen-permselective membranes by modified chemical vapor deposition. Microstructure and permselectivity of silica/carbon/Vycor membranes
Synthesis of hydrogen-permselective membranes by modified chemical vapor deposition. Microstructure and permselectivity of silica/carbon/Vycor membranes
复制标题
通过改进的化学气相沉积合成氢选择性渗透膜。
DOI：
10.1021/ie00005a009
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发表时间：
1992
影响因子：
4.2
通讯作者：
J.H.E. Glezer
中科院分区：
文献类型：
--
作者：
C. E. Megiris;J.H.E. Glezer
采用改进的化学气相沉积技术合成了对氢分离具有选择性的无机膜，该膜可耐受高达800 ℃的温度。在750 ° C下，三异丙基硅烷（C3 H7）3SiH蒸气与氧气在Vycor玻璃基片的孔口中反应，形成存款SiO2/C纳米结构。随后的反应导致在Vycor基底上生长多孔顶层
A modified chemical vapor deposition technique was employed for the synthesis of inorganic membranes that are selective for hydrogen separation and can withstand temperatures up to 800 o C. In an opposing reactants geometry and at 750 o C triisopropylsilane (C 3 H 7 ) 3 SiH vapors reacted with oxygen within the mouth of the pores of Vycor glass substrates to deposit SiO 2 /C nanostructures. Subsequent reaction resulted in the growth of a porous top layer on the Vycor substrate