Deposition of multicomponent metallic glass films by single-target magnetron sputtering
Deposition of multicomponent metallic glass films by single-target magnetron sputtering
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DOI：
10.1016/j.intermet.2011.10.007
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发表时间：
2012-02-01
期刊：
影响因子：
4.4
通讯作者：
Chen, M. W.
中科院分区：
文献类型：
--
作者：
Liu, Y. H.;Fujita, T.;Chen, M. W.
多组分金属玻璃薄膜继承了大块金属玻璃的上级力学性能和宽的过冷液相区，在微机电系统和纳米器件中的应用越来越受到人们的关注。本文系统地研究了单靶磁控溅射法制备多元金属玻璃薄膜的工艺。研究发现，工作氩气压力（P-Ar）和溅射功率是决定薄膜生长和成分的两个关键因素。在较高的P-Ar气氛下，玻璃膜以柱状生长方式生长，导致膜表面粗糙。在低P-Ar气氛下，薄膜呈现负的生长指数和接近原子级的平整表面。在合适的溅射功率和P-Ar气氛下，薄膜可以完全继承合金靶的成分，这为利用单靶制备成分可控的多元非晶薄膜提供了可能。在动力学标度理论的框架下讨论了玻璃膜生长的机制。这种可调的薄膜微结构和成分有望引导金属玻璃走向新的功能应用。(C)2011爱思唯尔有限公司保留所有权利。
Multicomponent metallic glass films inheriting the superior mechanical properties and wide supercooled liquid regions of their bulk counterparts attract increasing attentions for applications in micro-electro-mechanical systems and nano-devices. In this paper, we systematically investigated the growth of multicomponent metallic glass films synthesized using single-target magnetron sputtering. It was found that the working argon gas pressures (P-Ar,) and sputtering power are two key factors governing film growth and composition. At high P-Ar, the glassy films grow via a columnar mode, leading to rough film surface. At low P-Ar, the films exhibit a negative growth exponent and a nearly atomically flat surface. At appropriate sputtering power and P-Ar, the films can completely inherit the composition of alloy targets, which makes it possible to fabricate multicomponent glassy films with controllable composition using single targets. The mechanisms accounting for the growth of the glassy films are discussed in the framework of dynamic scaling theory. The diversely tunable film microstructure and composition are expected to lead metallic glasses towards new functional applications. (C) 2011 Elsevier Ltd. All rights reserved.