In-situ annealing of NiTi thin films at different temperatures
In-situ annealing of NiTi thin films at different temperatures
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DOI：
10.1016/j.sna.2014.10.034
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发表时间：
2015-01-01
影响因子：
4.6
通讯作者：
Momeni, Soroush
中科院分区：
文献类型：
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作者：
Tillmann, Wolfgang;Momeni, Soroush
磁控溅射NiTi薄膜通常在室温下溅射，需要进行后退火处理以促进结晶并获得形状记忆效应。然而，这种处理可能会对薄膜的微观结构和形态产生不利影响。在这项研究中，镍钛薄膜是通过溅射过程中的退火生成的。利用X射线衍射(XRD)、能量色散X射线光谱(EDX)、场发射扫描电子显微镜(FESEM)和差示扫描量热法(DSC)研究了溅射温度对薄膜形貌、成分和形状记忆行为的影响。 (C) 2014 Elsevier B.V. 保留所有权利。
Magnetron sputtered NiTi thin films are usually sputtered at ambient temperature and need a post-annealing treatment to promote crystallization and obtain shape memory effect. However, this treatment could adversely affect the microstructure as well as the morphology of the film. Within this study, NiTi thin films were generated by annealing during the sputtering process. The effect of the sputtering temperature on the morphology of the film, the composition, and shape memory behavior was studied using X-ray diffraction (XRD), energy-dispersive X-ray spectroscopy (EDX), field emission scanning electron microscopy (FESEM), and differential scanning calorimetry (DSC). (C) 2014 Elsevier B.V. All rights reserved.