Formation of Al/(Ti, Nb, Ta)‐Composite Oxide Films on Aluminum by Pore Filling
Formation of Al/(Ti, Nb, Ta)‐Composite Oxide Films on Aluminum by Pore Filling
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铝表面填充Al/(Ti,Nb,Ta)复合氧化膜的形成
DOI：
10.1149/1.1837892
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发表时间：
1997
影响因子：
3.9
通讯作者：
S. Yamaguchi
中科院分区：
文献类型：
--
作者：
M. Shikanai;M. Sakairi;Hideaki Takahashi;M. Seo;K. Takahiro;S. Nagata;S. Yamaguchi
将涂有多孔阳极氧化膜的铝试件浸泡在含Ti、Nb、Ta的溶液中，在400℃的空气中加热，在气孔内壁沉积Ti、Nb、Ta氧化物。在浸渍和加热过程中进行0到7个循环后，在中性硼酸盐溶液中进行阳极氧化，以Al{sub2}O{sub3}填充气孔。用透射电子显微镜、卢瑟福背散射光谱和阻抗测量研究了阳极氧化膜中钛、Nb、Ta氧化物的掺杂情况。再氧化至400V时，氧化膜中只有Ti、Nb、Ta氧化物的存在。Al/Ti复合氧化膜由外层Al/Ti复合氧化层、中间晶态氧化铝层和内层非晶氧化铝层组成，Al/Nb和Al/Ta复合氧化膜由外层复合氧化层和内层非晶氧化铝层组成。Al/Ti复合氧化物薄膜由于厚度小、介电常数高，其平行电容比其他两种薄膜高出40%。从离子在氧化膜上的传输角度讨论了复阳极氧化过程中复合氧化膜的形成机理。
Aluminum specimens coated with porous anodic oxide films were dipped in solutions containing Ti{sup 4+}, Nb{sup 5+}, or Ta{sup 5+} ions and heated in air mainly at 400 C to deposit Ti, Nb, or Ta oxide on the inner walls of pores. After 0 to 7 cycles of the dipping and heating process, the specimens were reanodized in a neutral borate solution to fill the pores with Al{sub 2}O{sub 3}. The incorporation of Ti, Nb, or Ta oxide in the anodic oxide films was examined by transmission electron microscopy Rutherford backscattering spectroscopy, and impedance measurements. Incorporation of Ti, Nb, or Ta oxide was found only in the outermost part of the anodic oxide film after reanodizing up to 400 V. The Al/Ti composite oxide films consisted of an outer Al/Ti-composite oxide layer, an intermediate crystalline alumina layer, and an inner amorphous alumina layer, while the Al/Nb- and Al/Ta-composite oxide films consisted of an outer composite oxide layer and an inner amorphous alumina layer. The parallel electric capacitance of Al/Ti-composite oxide film was 40% higher than those of the other two due to its small thickness and high dielectric constant. The formation mechanisms of the composite oxide films during reanodizing aremore » discussed in terms of the ion transport across the oxide film.« less