Miniature implantable tantalum/tantalum oxide stimulating electrodes.
Miniature implantable tantalum/tantalum oxide stimulating electrodes.
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微型植入式钽/氧化钽刺激电极。
DOI：
10.1109/tbme.1982.324946
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发表时间：
1982
期刊：
影响因子：
--
通讯作者：
Buchbinder,M
中科院分区：
文献类型：
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作者：
Lerner,H;Zahradnik,RT;Buchbinder,M
研制了适合于脑皮质内植入的微型电容型Ta/Ta_2O_5刺激电极。体外研究表明，它们在超过1000小时的连续脉冲下是稳定的。在其他地方进行的一项体内研究报告称，它们安全、有效，并且比传统金属电极更稳定。
Methods for fabricating miniature capacitor-type Ta/Ta2O5 stimulating electrodes suitable for intracortical implantation were developed. In vitro studies have shown them to be stable for over 1000 h of continuous pulsing. An in vivo study performed elsewhere has reported that they are safe, effective, and more stable than conventional metallic electrodes.