The topography of magnetron sputter-deposited Mg–Ti alloy thin films
The topography of magnetron sputter-deposited Mg–Ti alloy thin films
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DOI：
10.1016/j.matchemphys.2010.10.018
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发表时间：
2011-02
影响因子：
4.6
通讯作者：
G. Song;D. Haddad
中科院分区：
文献类型：
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作者：
G. Song;D. Haddad
Mg-Ti合金具有优异的耐腐蚀、氢化和可切换镜面性能。采用x射线衍射、原子力显微镜和扫描开尔文探针技术对磁控共溅射沉积Mg-Ti合金进行了分析，以确定其晶体取向、粒度、表面形貌和功函数。Ti原子掺入Mg HCP晶格后，晶胞参数略有降低，（0002）面明显抑制，（101¯0）和（101¯1）取向晶体生长，晶粒尺寸明显细化，表面粗糙度明显改变，对Mg的功函数有明显影响。这些观察到的Mg-Ti合金表面形貌和晶体结构的变化应该是其氢化/脱氢和可切换镜像性能的原因。
Mg–Ti alloys can have excellent corrosion, hydrogenation and switchable mirror performance. Magnetron co-sputter-deposited Mg–Ti alloys are analyzed using X-ray diffraction, atomic force microscopy and scanning Kelvin probe techniques to determine their crystal orientations, particle sizes, surface morphologies and work functions. The incorporation of Ti atoms into the Mg HCP lattice is found to slightly decrease the crystal unit cell parameters, substantially suppress (0002) plane, effectively facilitate the growth of (101¯0) and (101¯1) orientated crystals, significantly refine the particle size, noticeably alter the surface roughness and evidently influence the work function of Mg. These observed modifications in the surface morphologies and crystal structures of Mg–Ti alloys should be responsible for their reported hydrogenation/dehydrogenation and switchable mirror performance.