Novel Methods of Fabrication and Metrology of Superconducting NanoStructures
Novel Methods of Fabrication and Metrology of Superconducting NanoStructures
复制标题
超导纳米结构制造和计量的新方法
DOI：
--
复制
发表时间：
2007
影响因子：
5.6
通讯作者：
S. Lam
中科院分区：
文献类型：
--
作者：
L. Hao;J. Macfarlane;J. Gallop;D. Cox;P. Joseph;D. Hutson;Jie Chen;S. Lam
随着计量学向纳米尺度扩展，出现了许多潜在的应用和新的挑战。将光刻技术与聚焦离子束和/或电子束技术相结合，制备出了环路尺寸小于200nm、超导桥尺寸为80nm的超导量子干涉器件（squid）。这些鱿鱼有一系列潜在的应用。作为一个例子，我们描述了一种在极端极限下表征结构超导薄膜的有效面积和磁渗透深度的方法，其中超导渗透深度远远大于薄膜厚度，并且与器件的横向尺寸相当。
As metrology extends toward the nanoscale, a number of potential applications and new challenges arise. By combining photolithography with focused ion beam and/or electron beam methods, superconducting quantum interference devices (SQUIDs) with loop dimensions down to 200 nm and superconducting bridge dimensions of the order 80 nm have been produced. These SQUIDs have a range of potential applications. As an illustration, we describe a method for characterizing the effective area and the magnetic penetration depth of a structured superconducting thin film in the extreme limit, where the superconducting penetration depth $lambda$ is much greater than the film thickness and is comparable with the lateral dimensions of the device.