Roll-to-roll UV imprint lithography for flexible electronics
Roll-to-roll UV imprint lithography for flexible electronics
复制标题
DOI：
10.1016/j.mee.2011.02.022
复制
发表时间：
2011-08-01
影响因子：
2.3
通讯作者：
Onvlee, H.
中科院分区：
文献类型：
--
作者：
Maury, P.;Turkenburg, D.;Onvlee, H.
我们提出了一种卷对卷UV压印工具，作为一种具有mu分辨率的柔性PET箔图案的方法。为了克服箔的尺寸不稳定性及其对覆盖层的影响，研究了一种自对准方法，该方法允许在一次光刻步骤中制作多个层。采用灵活的镍邮票，有单级和2级。邮票是用传统的光学光刻和硅蚀刻在晶圆上制造的。采用厚度为50 μ m的电镀方法获得了单层和多层的薄镍复制品，并将柔性Ni邮票贴在放置在传统卷对卷机器上的主滚筒上。采用无溶剂UV抗蚀剂，通过阀喷喷嘴滴注。印迹速度为0.35 m/min，紫外光照为2 W。连续制作了50个印痕，相当于20米的箔长度。印迹质量高，重现性好。所有的特征类型都被复制，从500亩的接触垫到800亩宽的沟和1亩宽的线。在1 μ m厚的抗蚀剂中获得了800 nm的单级压印分辨率。(C) 2011 Elsevier B.V.版权所有。
We propose a roll-to-roll UV imprint lithography tool as a way to pattern flexible PET foil with mu m-resolution. As a way to overcome dimensional instability of the foil and its effect on overlay, a self-align approach was investigated, that permits to make several layers in a single lithography step. Flexible Ni-stamps were used, with a single level and with 2 levels. The stamps were fabricated on wafers using conventional optical lithography and Si etching. Thin Ni replica, both single and multilevel, were obtained by electroplating using a thickness of 50 mu m. The flexible Ni stamps were attached on the main drum that is placed on a conventional roll-to-roll machine. Resist was dispensed drop by drop by valve-jet nozzle using solvent-free UV resist. The imprint speed was of 0.35 m/min, using a UV illumination of 2 W. Fifty imprints were made in a row, equivalent to 20 m foil length. High imprint quality was observed with good reproducibility. All features type were replicated, from 500 mu m contact pads to 800 nm wide trenches and 1 mu m wide lines. A resolution of 800 nm in 1 mu m thick resist was obtained for single level imprint. Multi-level imprints (2 levels) show the same quality in replication with a resolution of 1 gm. (C) 2011 Elsevier B.V. All rights reserved.