Statistical equilibrium in particle channeling
Statistical equilibrium in particle channeling
复制标题
粒子通道的统计平衡
DOI:
10.1063/1.97694
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发表时间:
1987
期刊:
影响因子:
--
通讯作者:
J. Mannaerts
中科院分区:
文献类型:
--
作者:
B. Davidson;L. Feldman;J. Bevk;J. Mannaerts
We have used a unique sample configuration consisting of thin, epitaxial films of Ge sandwiched within a Si(100) lattice to explore the conditions for statistical equilibrium in particle channeling. Indications of nonequilibrium came about from a strong asymmetry in the off‐normal angular scans. We find the depth necessary to achieve statistical equilibrium to be ∼2200 A for 1.8 MeV He particle channeling along the Si〈110〉 direction. This measurement provides a useful guide for the interpretation of channeling experiments in a variety of near‐surface applications.