Generation mechanism of residual clamping force in a bipolar electrostatic chuck

Generation mechanism of residual clamping force in a bipolar electrostatic chuck
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双极静电吸盘残余夹紧力的产生机制

DOI:
10.1116/1.1620517
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发表时间:
2003
影响因子:
1.4
通讯作者:
T. Usui
T. Usui
中科院分区:
工程技术4区
文献类型:
--
作者:
S. Kanno;T. Usui

文献摘要

被引文献

相似文献

测量了具有电独立双电极的Johnsen-Rahbek型(JR型)双极静电卡盘(ESC)的夹持力和残余夹持力。ESC的两个电极的面积比范围从1到4.6。结果发现,每单位面积的夹紧力随面积比的增加而减小,每单位面积的残余夹紧力随面积比的增加而增加。为了揭示残余夹紧力产生的机理,建立了JR型双极型静电稳定器的等效电路模型。该模型表明,残余夹紧力是由两个单极ESC中的电荷差异导致的残余电荷引起的。电荷差异是由于ESC的介电层的电阻对电压的依赖性。由该模型计算的硅片电压与静电电压表测量的电压吻合较好。可以得出结论,该模型是适合模拟的双极ESC的性能。
Clamping and residual clamping forces of a Johnsen–Rahbek-type (JR-type) bipolar electrostatic chuck (ESC), which has electrically independent dual electrodes, were measured. Area ratios of the ESC’s two electrodes ranged from 1 to 4.6. It was found that the clamping force per unit area decreases with increasing area ratio and that the residual clamping force per unit area increases with increasing area ratio. To reveal the mechanism of residual clamping force, an equivalent circuit model of a JR-type bipolar ESC was devised. The model showed that the residual clamping force is caused by the residual charge that results from the charge difference in two monopolar ESCs. The charge difference is due to the resistance dependency on voltage of the dielectric layer of the ESC. The wafer voltage calculated from the model agreed well with the voltage measured by an electrostatic voltmeter. It can be concluded that the model is suitable for simulating the performance of a bipolar ESC.