Generation mechanism of residual clamping force in a bipolar electrostatic chuck
Generation mechanism of residual clamping force in a bipolar electrostatic chuck
复制标题
双极静电吸盘残余夹紧力的产生机制
DOI:
10.1116/1.1620517
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发表时间:
2003
影响因子:
1.4
通讯作者:
T. Usui
中科院分区:
文献类型:
--
作者:
S. Kanno;T. Usui
Clamping and residual clamping forces of a Johnsen–Rahbek-type (JR-type) bipolar electrostatic chuck (ESC), which has electrically independent dual electrodes, were measured. Area ratios of the ESC’s two electrodes ranged from 1 to 4.6. It was found that the clamping force per unit area decreases with increasing area ratio and that the residual clamping force per unit area increases with increasing area ratio. To reveal the mechanism of residual clamping force, an equivalent circuit model of a JR-type bipolar ESC was devised. The model showed that the residual clamping force is caused by the residual charge that results from the charge difference in two monopolar ESCs. The charge difference is due to the resistance dependency on voltage of the dielectric layer of the ESC. The wafer voltage calculated from the model agreed well with the voltage measured by an electrostatic voltmeter. It can be concluded that the model is suitable for simulating the performance of a bipolar ESC.