Reactive pulsed laser deposition of TiN
Reactive pulsed laser deposition of TiN
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TiN 反应脉冲激光沉积
DOI：
10.1016/0169-4332(92)90021-o
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发表时间：
1992
期刊：
影响因子：
--
通讯作者：
V. Craciun
中科院分区：
文献类型：
--
作者：
D. Craciun;V. Craciun
脉冲激光辐射已成功地用于薄膜氮化钛沉积。纯钛靶在氮气气氛中通过4J/cm 2、20 ns KrF激光脉冲反应性蒸发。研究了薄膜的性质。
Pulsed laser radiation has been successfully employed for thin film titanium nitride deposition. A pure titanium target was reactively evaporated in a nitrogen atmosphere by a 4 J/cm2, 20 ns KrF laser pulse. The properties of the thin deposited films are studied.