ELECTRODEPOSITION OF METALS AND ALLOYS - NEW RESULTS AND PERSPECTIVES
ELECTRODEPOSITION OF METALS AND ALLOYS - NEW RESULTS AND PERSPECTIVES
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DOI：
10.1016/0013-4686(94)e0023-s
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发表时间：
1994-06-01
影响因子：
6.6
通讯作者：
WINAND, R
中科院分区：
文献类型：
--
作者：
WINAND, R
在对理论进行总结后，介绍了Winand的原理图。该图给出了作为两个主要参数的函数的Fischer主要类型电沉积的稳定场：电流密度与扩散极限电流密度之比(传质)和缓蚀剂。该图已在法国自由贸易大学用作金属氯化物电沉积、高电流密度电镀和电精炼的基础，以及启动有关有机添加剂的研究。已有重要的工业应用，特别是在连续电镀钢板方面。新的研究领域包括成核和初始生长、基片影响过渡区、薄膜电镀和电铸、电解槽的精确流体动力学表征、有机添加剂和工厂模拟条件下的二次缓蚀研究、金相图像分析、微米和纳米合金研究、随时间变化的结构研究以及沉积与基材的结合。
After a summary of the theory, Winand's diagram is introduced. This diagram gives the fields of stability of Fischer's main types of electrodeposits as a function of two main parameters: the ratio of the current density to the diffusion limiting current density (mass transfer) and the inhibition.The diagram has been used at Universite Libre de Bruxelles as the basis for the chloride electrodeposition of metals, for high current density plating and electrorefining, and for initiating research concerning organic additives. Important industrial applications have been derived, especially in continuous steel sheet electroplating. The diagram has also been useful for alloys electrodeposition.New research areas include nucleation and initial growth, substrate influenced transition zone, thin film electroplating and electroforming, accurate hydrodynamic characterization of electrolytic cells, organic additives and secondary inhibition studies under plant simulation conditions, metallographic image analysis, micro- and nanoalloys studies, time dependent structures investigation, and deposit to substrate adhesion.