Concept of an imaging XPS system
Concept of an imaging XPS system
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XPS 成像系统的概念
DOI：
10.1002/sia.740110109
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发表时间：
1988
期刊：
影响因子：
--
通讯作者：
Graham C. Smith
中科院分区：
文献类型：
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作者：
M. Seah;Graham C. Smith
分析了成像XPS系统的概念，并讨论了各种方法。从仪器和设计的灵活性考虑，可以使用带有有效输入透镜的标准XPS系统在样品表面上形成光谱仪输入孔径的虚拟图像。可以使用预透镜扫描偏转器系统在样品表面上对该限定的分析区域进行光栅化。以这种方式，可以在10分钟内在直径10 mm的区域上形成256×256像素和250μm分辨率的良好XPS图像。提供的例子来自电子组装行业的零部件，证明绝缘体不会造成问题。然后详细介绍了优化25μm和10μm空间分辨率的XPS成像系统的设计考虑因素，包括预透镜扫描系统和位置敏感探测器。
The concept of an imaging XPS system is analysed and the various approaches discussed. For instrument and design flexibility it is shown that a standard XPS system with an efficient input lens can be used to form a virtual image of the spectrometer input aperture on the sample surface. This defined area of analysis may be rastered across the sample surface using a pre-lens scanning deflector system. In this way good XPS images of 256 × 256 pixels and of 250 μm resolution over an area of diameter 10 mm may be formed in ten minutes. Examples are provided from components for the electronics assembly industry demonstrating that insulators cause no problems. Design considerations are then detailed for optimizing imaging XPS systems at 25 μm and 10 μm spatial resolution involving pre-lens scanning systems and position-sensitive detectors.