The characteristics of optics polished with a polyurethane pad
The characteristics of optics polished with a polyurethane pad
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DOI：
10.1364/oe.16.010285
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发表时间：
2008-07-07
期刊：
影响因子：
3.8
通讯作者：
Guo, Yinbiao
中科院分区：
文献类型：
--
作者：
Li, Yaguo;Hou, Jing;Guo, Yinbiao
研究了聚氨酯抛光垫抛光光学工件的效果，包括材料去除率、表面粗糙度和亚表面损伤。通常采用光学抛光沥青来抛光光学工件，但沥青的材料去除率（MRR）很低，因此用聚氨酯泡沫代替抛光沥青。使用聚氨酯垫，获得了高得多的MRR。还检查了工件的表面粗糙度和亚表面损伤。我们很高兴地发现，有几乎没有亚表面损伤与垫抛光制造的工件和表面粗糙度是与沥青抛光的结果。最后，提出了一个假设，试图解释的结果，工件是无缺陷的。(c)2008年美国光学学会。
The effect of polishing an optical workpiece with a polyurethane pad was studied in this paper, including material removal rate, surface roughness and subsurface damage. Usually, optical polishing pitch is applied to polish optical workpieces, but the material removal rate (MRR) of pitch is quite low, and polyurethane foam is thus substituted for polishing pitch. With the polyurethane pad a much higher MRR was obtained. Surface roughness and subsurface damage of workpieces were also examined. We were gratified to find that there was almost no subsurface damage in the workpieces manufactured with pad polishing and surface roughness was comparable to the result of pitch polishing. Finally, a hypothesis was proposed in an attempt to explain the result that workpieces were defect-free. (c) 2008 Optical Society of America.