Monte Carlo calculations of gas rarefaction in a magnetron sputtering discharge
Monte Carlo calculations of gas rarefaction in a magnetron sputtering discharge
复制标题
磁控溅射放电中气体稀疏的蒙特卡罗计算
DOI：
10.1116/1.579537
复制
发表时间：
1995
期刊：
影响因子：
--
通讯作者：
G. M. Turner
中科院分区：
文献类型：
--
作者：
G. M. Turner
本文用蒙特卡罗方法计算了磁控溅射放电中溅射原子流碰撞能量转移引起的填充气体稀薄化。计算了Ar和Ne填充气体以及C、Al、Ti、Cu、W和Au溅射原子在平行阴极和衬底平面之间的填充气体温度分布。研究了充放电气体压力、放电电压、放电电流和阴极-衬底间距等因素的影响。在恒定的填充气体压力下，在高放电电流的极限下，最高温度与放电电流的平方根近似成正比;在恒定的压力和放电电压、电流下，最高温度随阴极-衬底间距线性增加。填充气体的加热是更大的Ar比Ne，由于在热导率，溅射产率，碰撞截面，和平均分数的能量转移从溅射原子在碰撞。加热的幅度也强烈地依赖于被溅射的材料，主要由溅射产率确定，特别是在高压下，并且在较小程度上由溅射和填充气体原子组合的碰撞横截面、质量和结合能确定。用Monte Carlo方法计算了磁控溅射放电中溅射原子碰撞能量转移引起的填充气体的稀薄化，结果表明，在相同的放电条件下，以C为溅射材料时Ar的加热可以忽略，而以Au为溅射材料时填充气体的稀薄化最大。计算了Ar和Ne填充气体以及C、Al、Ti、Cu、W和Au溅射原子在平行阴极和衬底平面之间的填充气体温度分布。研究了充放电气体压力、放电电压、放电电流和阴极-衬底间距等因素的影响。在恒定的填充气体压力下，在高放电电流的极限下，最高温度与放电电流的平方根近似成正比;在恒定的压力和放电电压、电流下，最高温度随阴极-衬底间距线性增加。填充气体的加热是更大的Ar比Ne，由于在热导率，溅射产率，碰撞截面，和平均分数的能量从溅射原子转移的差异。
Monte Carlo calculations have been made of the rarefaction of the filling gas in a magnetron sputtering discharge due to collisional energy transfer from the flux of sputtered atoms. Temperature profiles of the filling gas between parallel cathode and substrate planes were calculated for both Ar and Ne filling gases and for C, Al, Ti, Cu, W and Au sputtered atoms. The effects of filling gas pressure, discharge voltage and current and cathode‐substrate separation were also studied. At constant filling gas pressure, and in the limit of high discharge current, the maximum temperature was approximately proportional to the square root of the discharge current; for constant pressure and discharge voltage and current, the maximum temperature increased linearly with the cathode‐substrate separation. The heating of the filling gas was greater for Ar than for Ne, due to differences in the thermal conductivity, sputtering yield, collision cross section, and average fraction of energy transferred from sputtered atoms in a collision. The magnitude of heating also depended strongly on the material being sputtered, primarily being determined by the sputtering yield, particularly at high pressures, and to a lesser extent by the collision cross section, masses, and binding energy of the sputtered and filling gas atom combination. Negligible heating of Ar was calculated for C as the sputtered material, while maximum rarefaction was produced using Au for the same discharge conditions.Monte Carlo calculations have been made of the rarefaction of the filling gas in a magnetron sputtering discharge due to collisional energy transfer from the flux of sputtered atoms. Temperature profiles of the filling gas between parallel cathode and substrate planes were calculated for both Ar and Ne filling gases and for C, Al, Ti, Cu, W and Au sputtered atoms. The effects of filling gas pressure, discharge voltage and current and cathode‐substrate separation were also studied. At constant filling gas pressure, and in the limit of high discharge current, the maximum temperature was approximately proportional to the square root of the discharge current; for constant pressure and discharge voltage and current, the maximum temperature increased linearly with the cathode‐substrate separation. The heating of the filling gas was greater for Ar than for Ne, due to differences in the thermal conductivity, sputtering yield, collision cross section, and average fraction of energy transferred from sputtered atoms...