Uniform Surface Patterning with Two-Dimensional Gold Nanoparticle Array Excited by Oblique Femtosecond Laser Irradiation
Uniform Surface Patterning with Two-Dimensional Gold Nanoparticle Array Excited by Oblique Femtosecond Laser Irradiation
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DOI：
10.1143/jjap.49.055001
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发表时间：
2010-05
影响因子：
1.5
通讯作者：
T. Miyanishi;Yuto Tanaka;M. Terakawa;M. Obara
中科院分区：
文献类型：
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作者：
T. Miyanishi;Yuto Tanaka;M. Terakawa;M. Obara
我们目前的光场分布和纳米孔图案化的性质时，飞秒激光照射倾斜的硅表面上的二维（2D）金纳米粒子阵列的硅衬底。有必要通过调节颗粒间的距离和激光的入射角来控制金纳米颗粒阵列中的等离子体激元，以便用800 nm飞秒激光均匀地形成纳米孔图案。采用时域有限差分法（FDTD）计算和飞秒激光实验研究了均匀二维纳米孔的图形化。当粒子间距大于200 nm，入射角约为50°时，采用直径为200 nm的金粒子阵列，Si表面的近场强度远大于单个孤立粒子。p偏振入射激光对衬底表面的倾斜照射确保实现均匀的纳米孔阵列图案化。
We present optical field distributions and nanohole patterning properties on a silicon substrate when a femtosecond laser is irradiated obliquely to a two-dimensional (2D) gold nanoparticle array on a silicon surface. It is necessary to control plasmon polaritons in a gold nanoparticle array by adjusting interparticle distance and the incident angle of the laser for uniform nanohole patterning with an 800 nm femtosecond laser. The uniform 2D nanohole patterning is studied by finite-difference time-domain (FDTD) calculation and experiment using a femtosecond laser. Using an array with gold particles of 200 nm diameter, the near-field intensity on the Si surface is much larger than that of a single isolated particle if the interparticle distance is larger than 200 nm and the incident angle is approximately 50°. The oblique irradiation of p-polarized incident laser to the surface of the substrate ensures that uniform nanohole array patterning is achieved.