Multipactor Discharge in a Dielectric-loaded Accelerating Structure
Multipactor Discharge in a Dielectric-loaded Accelerating Structure
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DOI：
10.1063/1.2435709
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发表时间：
2006-06
期刊：
影响因子：
--
通讯作者：
Wu Lin;L. Ang
中科院分区：
文献类型：
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作者：
Wu Lin;L. Ang
通过建立介电加载加速结构的极化率图和动力学模型，将二次电子倍增放电模型推广到一个简单的射频窗口上，描述了介电加载加速结构中由于二次电子发射而沉积的电子倍增及其功率。静态（恒定电场）和动态（可变电场）计算均使用蒙特卡罗模拟进行，其中二次电子的发射速度和发射角度具有随机分布，以真实的二次电子产率曲线作为输入
The model of multipactor discharge was extended on a simple rf window to describe the electron multiplication and its power deposited in dielectric-loaded accelerating structures due to secondary electron emissions by developing the susceptibility diagram and dynamic models for such structures. Both static (constant electric fields) and dynamic calculations (changeable electric fields) were performed using Monte Carlo simulations with random distributions in the emission velocities and emission angles of the secondary electrons, taking realistic secondary electron yield curves as input