Aspect ratio dependence of magnetoresistivity in polycrystalline bismuth microwire arrays

Aspect ratio dependence of magnetoresistivity in polycrystalline bismuth microwire arrays
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DOI:
10.1063/1.2432876
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发表时间:
2007-02-01
影响因子:
3.2
通讯作者:
Nakamura, Hiroaki
Nakamura, Hiroaki
中科院分区:
物理与天体物理3区
文献类型:
--
作者:
Hasegawa, Yasuhiro;Nakano, Hirofumi;Nakamura, Hiroaki

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Magnetoresistivity measurements of polycrystalline bismuth microwire arrays having a range of different diameters and a bulk sample were performed under applied magnetic fields between 0 and 2 T and temperatures from 50 to 300 K. A thin film layer was deposited on the terminations of the microwire arrays in order to completely eliminate contact resistance. The measured resistivities were in very good agreement with those of polycrystalline bulk bismuth over the entire measured temperature range, even when the resistances had different values. The magnetoresistivities increased when a magnetic field was applied, and the rate of increase of the magnetoresistivities with applied magnetic field varied in samples having different aspect ratios. It was conjectured that this variation in the rate of increase is related to the aspect ratio. Suppression of magnetoresistivity in the microwire arrays was confirmed experimentally using bulk bismuth since the aspect ratio of the microwire arrays was much larger than that of the bulk sample. The geometrical contribution of the high aspect ratio on the magnetic effect in microwire and nanowire arrays makes it possible to enhance the thermoelectric performance of materials by suppressing the magnetoresistivity and increasing the magneto-Seebeck coefficient. (c) 2007 American Institute of Physics.