Microstructure and magnetic property of electroless-plated CoNiFeB soft underlayer
Microstructure and magnetic property of electroless-plated CoNiFeB soft underlayer
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DOI：
10.1016/j.jmmm.2008.08.056
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发表时间：
2008-11
影响因子：
2.7
通讯作者：
W. Xia;Joo-Kyun Kim;T. Yogo;D. Shindo;M. Ito;K. Ohashi
中科院分区：
文献类型：
--
作者：
W. Xia;Joo-Kyun Kim;T. Yogo;D. Shindo;M. Ito;K. Ohashi
用磁光克尔效应显微镜、磁力显微镜和透射电镜研究了化学镀CoFeNiB薄膜作为垂直磁记录软底层的特性。各向异性CoFeNiB薄膜在镀制过程中处于外加电场作用下，杂散场得到明显抑制。磁通线表明Ni种子层对CoFeNiB层的均匀磁状态没有本征影响。通过电子全息术清楚地观察到MFM尖端和CoFeNiB层之间的相互作用，表明软衬层所需的优异的软磁性能。
An electroless-plated CoFeNiB film as a soft underlayer in perpendicular magnetic recording is studied by magneto-optical Kerr effect microscope, magnetic force microscopy (MFM), and transmission electron microscopy. A stray field is evidently suppressed for the anisotropic CoFeNiB film, which is under an applied field during the plating process. The lines of magnetic flux show that the Ni seed layer have no intrinsic effect on the homogenous magnetic state of the CoFeNiB layer. The interaction between a MFM tip and the CoFeNiB layer is clearly observed by electron holography indicating the excellent soft magnetic properties required by the soft underlayer.