Reproducible Growth of Metalorganic Chemical Vapor Deposition Derived YBa2Cu3Ox Thin Films Using Ultrasonic Gas Concentration Analyzer
Reproducible Growth of Metalorganic Chemical Vapor Deposition Derived YBa2Cu3Ox Thin Films Using Ultrasonic Gas Concentration Analyzer
复制标题
使用超声波气体浓度分析仪再现金属有机化学气相沉积衍生的 YBa2Cu3Ox 薄膜
DOI：
10.1143/jjap.38.4727
复制
发表时间：
1999
期刊：
影响因子：
--
通讯作者：
S. Oda
中科院分区：
文献类型：
--
作者：
Shuu'ichirou Yamamoto;K. Nagata;S. Sugai;A. Sengoku;Y. Matsukawa;T. Hattori;S. Oda
我们报告，详细地说，在金属有机化学气相沉积（MOCVD）的YBa2Cu3Ox（YBCO）的超声测量和一个新开发的反馈系统，以解决再现性问题的前体浓度监测。已清楚地观察到二特戊酰甲烷（DIPV）化合物的流速的波动。我们提出了一个反馈系统，使用超声波浓度分析仪和两套质量流量控制器的每一个前体，并已证明了操作的有效性。
We report, in detail, on precursor concentration monitoring in the metalorganic chemical vapor deposition (MOCVD) of YBa2Cu3Ox (YBCO) by ultrasonic measurement and a newly developed feedback system to solve reproducibility problems. The fluctuation of the flow rate of dipivaloylmethanate (DPM) compounds has been clearly observed. We have proposed a feedback system using an ultrasonic concentration analyzer and two sets of mass flow controllers for each precursor, and have proven the validity of the operation.