H.Ito, H.Miki, K.C.Namiki, N.Ito, H.Saitoh: "Dissociative excitation reaction of CH-3CN with the discharge flow of Ar : prediction of the [N]/([N]+[C])ratio of hydrogenated amorphous carbon nitride films in the desiccated system"Japanese Journal of Applie
H.Ito, H.Miki, K.C.Namiki, N.Ito, H.Saitoh: "Dissociative excitation reaction of CH-3CN with the discharge flow of Ar : prediction of the [N]/([N]+[C])ratio of hydrogenated amorphous carbon nitride films in the desiccated system"Japanese Journal of Applie
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H.Ito、H.Miki、K.C.Namiki、N.Ito、H.Saitoh：“CH-3CN 与 Ar 放电流的解离激发反应：[N]/([N] [C]) 比率的预测
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