Surface Reactions of Low-Energy Argon Ions with Organometallic Precursors

Surface Reactions of Low-Energy Argon Ions with Organometallic Precursors
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低能Ar离子与金属有机前驱体的表面反应

DOI:
10.1021/acs.jpcc.0c07269
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发表时间:
2020-10
影响因子:
3.7
通讯作者:
Elif Bilgilisoy;R. Thorman;Jo-Chi Yu;Timothy B. Dunn;H. Marbach;L. McElwee‐White;D. Fairbrother
Elif Bilgilisoy;R. Thorman;Jo-Chi Yu;Timothy B. Dunn;H. Marbach;L. McElwee‐White;D. Fairbrother
中科院分区:
化学3区
文献类型:
--
作者:
Elif Bilgilisoy;R. Thorman;Jo-Chi Yu;Timothy B. Dunn;H. Marbach;L. McElwee‐White;D. Fairbrother

文献摘要

被引文献

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原位X射线光电子能谱和质谱的组合已被用来阐明由低能量(860 eV)的氩离子相互作用引发的基本表面反应。
A combination of in situ X-ray photoelectron spectroscopy and mass spectrometry has been used to elucidate the elementary surface reactions initiated by the interaction of low-energy (860 eV) argon...