Ultra-low stress SiO2 coatings by ion beam sputtering deposition.
Ultra-low stress SiO2 coatings by ion beam sputtering deposition.
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DOI：
10.1364/ao.380844
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发表时间：
2020-03
期刊：
影响因子：
1.9
通讯作者：
A. Davenport;E. Randel;C. Menoni
中科院分区：
文献类型：
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作者：
A. Davenport;E. Randel;C. Menoni
高机械应力会影响多层薄膜光学涂层的性能，导致波前像差。如果多层堆叠被沉积在薄衬底上，例如用于自适应光学的衬底，这一点尤其重要。薄膜中的应力与沉积过程有关，而离子束溅射(IBS)薄膜具有较高的压应力。在本工作中，我们证明了在保持高光学质量的情况下，在沉积过程中使用高能O2辅助离子轰击可以将IBSSiO_2薄膜中的应力从490 Mpa降低到48 Mpa。比较了氧化物靶材和金属靶材沉积的SiO_2薄膜的应力降低效果。
High mechanical stress can affect the performance of multilayer thin film optical coatings, causing wavefront aberrations. This is particularly important if the multilayer stack is deposited onto thin substrates, such as those used in adaptive optics. Stress in thin film coatings is dependent on the deposition process, and ion beam sputtering (IBS) thin films are known to have high compressive stress. In the present work, we show that stress in IBS $ {{\rm SiO}_2} $SiO2 thin films can be reduced from 490 MPa to 48 MPa using high-energy $ {{\rm O}_2} $O2 assist ion bombardment during deposition while maintaining high optical quality. A comparison of the reduction of stress in $ {{\rm SiO}_2} $SiO2 deposited from oxide and metal targets is provided.