Observation of oxygen enrichment in zirconium oxide films
Observation of oxygen enrichment in zirconium oxide films
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氧化锆薄膜中氧富集的观察
DOI：
10.1116/1.578775
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发表时间：
1993
期刊：
影响因子：
--
通讯作者：
M. Salim
中科院分区：
文献类型：
--
作者：
E. E. Khawaja;F. Bouamrane;A. Hallak;M. A. Daous;M. Salim
研究了影响电子束蒸发氧化锆薄膜光学质量的主要沉积参数，包括衬底温度和氧分压。发现这些薄膜在光学上是不均匀的。卢瑟福后向散射光谱和x射线光电子能谱（XPS）显示，薄膜中含有过量的氧。XPS表明，过量的氧气可能是由于吸附的水。然而，随着氧分压的增加，氧含量的增加表明，在沉积过程中，一些多余的氧可能已经嵌入了薄膜中。
A study of the major deposition parameters, including substrate temperature and oxygen partial pressure, affecting the optical quality of electron beam evaporated zirconium oxide films is presented. The films were found to be optically inhomogeneous. Rutherford backscattering spectroscopy and x‐ray photoelectron spectroscopy (XPS) revealed that the films had an excess of oxygen. XPS suggested that the excess oxygen may be due to adsorbed water. However, an increase in the oxygen content with oxygen partial pressure indicated that some of the excess oxygen may have been embedded in the films during deposition.