Focused MOKE Study of Self-Assembly Nanoscale Fe Ni Dot Arrays
Focused MOKE Study of Self-Assembly Nanoscale Fe Ni Dot Arrays
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发表时间：
2008
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通讯作者：
D. Niu;X. Zou;Yongbing Xu
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作者：
D. Niu;X. Zou;Yongbing Xu
使用纳米球光刻 (NSL) 技术，我们在硅基板上制造了轮廓清晰的三角形 Fe Ni 点阵列，其特征尺寸小至 30 nm。面内聚焦磁光克尔效应 (MOKE) 测量表明，与 50 Oe 的连续薄膜相比，这些纳米级点阵列的矫顽力提高了约 200 Oe。结合微磁计算，我们发现磁化过程分为两个步骤，首先是顶角的旋转，然后是底部底座的切换，从而控制点的矫顽力。
Using nanosphere lithography (NSL) technique, we have fabricated well defined triangular shaped Fe Ni dot arrays with feature size down to 30 nm on silicon substrate. In-plane focused magneto-optical Kerr effect (MOKE) measurements show that these nanoscale dot arrays have an enhanced coercivity of around 200 Oe compared with that of the continuous thin film of 50 Oe. In combining with micromagnetic calculations, we found that the magnetization process follows two steps, the rotation of the top corner and then a switching of the bottom base, which controls the coercivity of the dots.