Effect of step edges on the growth of Pt thin films on oxide single-crystal substrates
Effect of step edges on the growth of Pt thin films on oxide single-crystal substrates
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DOI：
10.2109/jcersj2.121.278
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发表时间：
2013-03
影响因子：
1.1
通讯作者：
T. Shiota;Hiroki Ito;N. Wakiya;J. Cross;O. Sakurai;K. Shinozaki
中科院分区：
文献类型：
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作者：
T. Shiota;Hiroki Ito;N. Wakiya;J. Cross;O. Sakurai;K. Shinozaki
为了研究台阶边缘对氧化物衬底上Pt薄膜生长的影响，采用脉冲激光沉积法在673和973 K下分别在SrTiO 3（100）、金红石TiO 2（100）和Al 2 O 3（11 <$20）台阶表面上生长了Pt薄膜。在673 K下，SrTiO_3薄膜的台阶边缘对薄膜生长没有明显的影响。然而，铂颗粒的尺寸较大的台阶边缘比在梯田在973 K。在973 K时，Pt表面扩散的长度大于平均平台宽度，而在673 K时则小于平均平台宽度。在973 K下，在TiO 2上也观察到类似的生长行为，而在Al 2 O3的情况下，台阶边缘没有明显的影响。Pt的扩散长度被估计为长于梯田宽度上的TiO 2和短的Al 2 O 3。因此，可以通过考虑Pt表面扩散来理解台阶边缘的影响。
To study the effect of step edges on the growth of Pt thin films on oxide substrates, Pt films were grown on SrTiO3(100), rutile TiO2(100), and Al2O3(1120) stepped surfaces at 673 and 973K by pulsed laser deposition. No clear effect due to the step edges on the film growth was found on the SrTiO3 at 673K. However, the Pt grains were larger in size at the step edges than on the terraces at 973K. The estimated length of the Pt surface diffusion was longer than the average terrace width at 973K and shorter at 673K. Similar growth behavior was also observed on the TiO2 at 973K, while there was no clear effect caused by the step edges in the case of the Al2O3. The Pt diffusion length was estimated to be longer than the terrace width on the TiO2 and shorter on the Al2O3. The effect of the step edges can therefore be understood by considering the Pt surface diffusion.