Multifractal analysis and optical properties of nanostructured silicon layers
Multifractal analysis and optical properties of nanostructured silicon layers
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DOI：
10.1016/j.apsusc.2016.04.059
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发表时间：
2017-02-15
影响因子：
6.7
通讯作者：
Kobayashi, Hikaru
中科院分区：
文献类型：
--
作者：
Jurecka, Stanislav;Matsumoto, Taketoshi;Kobayashi, Hikaru
为了优化半导体器件中的光捕获，特别是在太阳能电池中，通常使用微纹理结构。采用表面结构化学转移法（SSCT）在平面和纵向织构单晶硅片上形成了超低光谱反射率结构。该方法基于在HF溶液中与Pt网接触的处理表面的有效蚀刻。SSCT层的结构由蚀刻条件决定，并显著影响其光学性质。我们研究了SSCT层的微观结构特性的SEM和AFM的方法，我们分析了获得的形态信息的多重分形（MF）和傅立叶方法。蚀刻表面层的性质决定了光谱反射率和拉曼散射。光谱反射率的指数下降是由层密度梯度引起的，拉曼散射的增强与SSCT蚀刻过程中小颗粒尺寸分数的形成有关。MF和傅立叶分析的结果被用来解释所形成的微织构结构的光学性质。(C)© 2016 Elsevier B.V.版权所有。
For the optimization of the light trapping in semiconductor devices, especially in the solar cells, micro textured structures are commonly used. Structures with ultralow spectral reflectance were formed on flat and pyramidally textured single crystalline silicon wafers by using of the surface structure chemical transfer method (SSCT). This method is based on effective etching of treated surface in HF solution in contact with a Pt mesh. The structure of the SSCT layer is determined by the etching conditions and influences substantially its optical properties. We studied microstructural properties of the SSCT layers by the SEM and AFM methods and we analyzed obtained morphological information by the multifractal (MF) and Fourier methods. The properties of etched surface layers determine the spectral reflectance and Raman scattering. Exponential fall of the spectral reflectance is caused by the gradient of layer density and enhancement of Raman scattering is related to forming of small particle size fraction during the SSCT etching. Results of MF and Fourier analysis are used in interpretation of the optical properties of formed microtextured structures. (C) 2016 Elsevier B.V. All rights reserved.