Integration of Atomically Dispersed Cu–N4 Sites with C3N4 for Enhanced Photo-Fenton Degradation over a Nonradical Mechanism
Integration of Atomically Dispersed Cu–N4 Sites with C3N4 for Enhanced Photo-Fenton Degradation over a Nonradical Mechanism
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原子分散的 Cu-N4 位点与 C3N4 的整合,通过非自由基机制增强光芬顿降解
DOI:
10.1021/acsestengg.2c00261
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发表时间:
2022
期刊:
影响因子:
--
通讯作者:
Zhiyi Lu
中科院分区:
文献类型:
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作者:
Shuqian Dong;Xu Chen;Linfeng Su;Yingjie Wen;Yuechu Wang;Qihao Yang;Li Yi;Wenwen Xu;Qiu Yang;Peilei He;Yunqing Zhu;Zhiyi Lu
Photo-Fenton degradation as a promising strategy for antibiotic wastewater treatment attracted extensive attention, while the unsatisfactory catalytic performance vitally limits its industrial application. Herein, we demonstrate that confining atomically dispersed Cu into C3N4(Cu–C3N4) enables fast H2O2activation and efficient separation of photogenerated electron–hole pairs, resulting in a dramatic improvement of the degradation efficiency of the Photo-Fenton reaction. Photo-Fenton degradation of ciprofloxacin (CIP) was close to 99% within 30 min over optimized Cu–C3N4, corresponding to a pseudo-first-order rate constant of ∼0.0978 min–1, almost 4.5 times higher than pure C3N4counterpart. The electron paramagnetic resonance, quenching experiments, and X-ray absorption fine structure results reveal that the superior Photo-Fenton catalytic performance is attributed to a nonradical reaction pathway, where the H2O2is activated by the formation of the O═Cu–N4═O intermediate. The advanced catalyst as well as the refreshing H2O2activation mechanism are of profound significance for the materials design in the wastewater treatment field.