On-chip high-Q spiral Cu inductors embedded in wafer-level chip-scale package for silicon RF application
On-chip high-Q spiral Cu inductors embedded in wafer-level chip-scale package for silicon RF application
复制标题
嵌入晶圆级芯片级封装的片上高 Q 螺旋铜电感器,适用于硅 RF 应用
DOI:
10.1109/mwsym.2004.1335843
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发表时间:
2004
期刊:
影响因子:
--
通讯作者:
T. Ito
中科院分区:
文献类型:
--
作者:
K. Itoi;M. Sato;H. Abe;H. Sugawara;H. Ito;K. Okada;K. Masu;T. Ito
On-chip high-Q spiral inductors on Si substrate with thick resin layer have been fabricated. These inductors were fabricated by a thick Cu electroplated rerouting and separated more than 10 /spl mu/m from Si substrate by a thick resin layer. The inductance L of 5.2 and 4.9 nH with a quality factor Q of 18.1 and 27.5 were obtained for a 3.5 turn rectangle spiral inductor at 2 GHz in /spl rho/ of 4-6, 1k /spl Omega/cm, respectively. This technology is favorable for Si RF application to minimize the stray inductance from wire-bonding and reducing circuit resistance.