Impurity redeposition in the SOL of TEXTOR after boronization
Impurity redeposition in the SOL of TEXTOR after boronization
复制标题
渗硼后 TEXTOR SOL 中的杂质再沉积
DOI：
10.1016/0022-3115(90)90037-n
复制
发表时间：
1990
期刊：
影响因子：
--
通讯作者：
B. Emmoth
中科院分区：
文献类型：
--
作者：
P. Wienhold;J. Seggern;H. G. Esser;J. Winter;H. Bergsåker;M. Rubel;I. Gudowska;B. Emmoth
硼化后，TEXTOR SOL中收集器探针上再沉积的材料被确定为a-C/B：D，即与原始涂层几乎相同。对于100 nm厚度，转换因子为6.3 × 1017C/cm~2，对应密度ρ = 1.26 g/cm~2。C和B从涂覆的石墨限制器的侵蚀导致放电期间的静止沉积和SOL内的分布。放电200次后，比B/C = 0.23，低于初始值（B/C = 1 - 0.5）。用收集器探针进行的观察证实了由于硼化而减少的等离子体的C和O污染。在通过分层存款的AES深度剖析进行综合曝光后，已逐点确定了碳率。沉积速率通常为1 × 1016C/cm 2s，在ta +2 cm和ne = 2.8 × 1013cm − 3时发现。它在较低的密度下增加，就像其他杂质一样。
The material redeposited on the collector probe in the SOL of TEXTOR after boronization has been identified as a-C/B : D, i.e. as almost identical with the virgin coating. A conversion factor of 6.3 × 1017C/cm2for 100 nm thickness was found which corresponds to a density ρ = 1.26 g/cm2. Erosion of C and B from the coated graphite limiters causes stationary deposition during the discharge and distributions within the SOL. After 200 discharges the ratio B/C= 0.23 is lower than the original (B/C= 1-0.5). Observations made with the collector probe confirm the reduced C and O contamination of the plasma due to boronization.Carbon rates have been determined shotwise after an integrated exposure by AES-depth profiling of the stratified deposit. A deposition rate of 1 × 1016C/cm2s typically was found ata+ 2 cm andne= 2.8 × 1013cm−3. It increases at lower densities as do the other impurities.