The mechanism for self-formation of a CeO2 diffusion barrier layer in an aluminide coating at high temperature
The mechanism for self-formation of a CeO2 diffusion barrier layer in an aluminide coating at high temperature
复制标题
铝化物涂层高温自形成CeO2扩散阻挡层的机理
DOI:
10.1016/j.surfcoat.2013.03.003
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发表时间:
2013-06
影响因子:
5.4
通讯作者:
X.Peng
中科院分区:
文献类型:
--
作者:
X.Tan;X.Peng
A CeO2dispersed δ-Ni2Al3was formed by partially aluminizing an electrodeposited Ni film containing CeO2. The aluminide/Ni–CeO2coating system itself quickly formed a CeO2-rich diffusion barrier between aluminide and Ni during annealing in vacuum at 1000°C. A model for the formation of the diffusion barrier was proposed, based on the characterization of the evolution with time of the phase compositions of the aluminide at the interface.
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DOI:
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