Tolerancing of diffraction-limited Kirkpatrick-Baez synchrotron beamline optics for extreme-ultraviolet metrology.
Tolerancing of diffraction-limited Kirkpatrick-Baez synchrotron beamline optics for extreme-ultraviolet metrology.
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用于极紫外计量的衍射极限 Kirkpatrick-Baez 同步加速器光束线光学器件的公差。
DOI：
10.1364/ao.40.003703
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发表时间：
2001
期刊：
影响因子：
1.9
通讯作者：
James H. Underwood
中科院分区：
文献类型：
--
作者：
P. Naulleau;Kenneth A. Goldberg;P. Batson;Seongtae Jeong;James H. Underwood
最近的兴趣在极紫外（EUV）光刻，导致了在同步加速器光束线上实现的波长计量阵列的发展。这些光束线通常使用Kirkpatrick-Baez（K-B）系统，该系统由两个垂直的椭圆弯曲镜串联组成。为了实现高效聚焦到小光斑中，这些系统需要前所未有的制造和装配公差。在这里，我们提出了一个详细的误差预算分析，并制定了一套规范的K-B光学操作的EUV干涉光束线在劳伦斯伯克利国家实验室的先进光源的衍射极限性能。这些规格是基于代码v建模工具开发明确为这些光学系统。虽然是为一个特定的系统开发的，但这里给出的对准灵敏度通常与K-B系统设计有关。
The recent interest in extreme-ultraviolet (EUV) lithography has led to the development of an array of at-wavelength metrologies implemented on synchrotron beamlines. These beamlines commonly use Kirkpatrick-Baez (K-B) systems consisting of two perpendicular, elliptically bent mirrors in series. To achieve high-efficiency focusing into a small spot, unprecedented fabrication and assembly tolerance is required of these systems. Here we present a detailed error-budget analysis and develop a set of specifications for diffraction-limited performance for the K-B optic operating on the EUV interferometry beamline at Lawrence Berkeley National Laboratory's Advanced Light Source. The specifications are based on code v modeling tools developed explicitly for these optical systems. Although developed for one particular system, the alignment sensitivities presented here are relevant to K-B system designs in general.