Nanosecond high current and high repetition rate electron source
Nanosecond high current and high repetition rate electron source
复制标题
DOI：
10.1109/deiv.1998.738831
复制
发表时间：
1998-08
期刊：
影响因子：
--
通讯作者：
V. Gushenets;N. Koval’;P. M. Schanin;V. S. Tolkachev
中科院分区：
文献类型：
--
作者：
V. Gushenets;N. Koval’;P. M. Schanin;V. S. Tolkachev
研制了一种用于产生高重复频率纳秒级电子束的等离子体空心阴极宽束源。源寿命超过10/sup 9/ shots。为了降低工作气压和缩短阴极腔中等离子体形成所需的时间，采用了辅助触发空心阴极辉光放电。在加速电压为40 keV，脉冲重复频率为50-1000 Hz，脉冲宽度为100 ns的条件下，产生了电流高达200 A，上升时间为25 ns的电子束。
A broad electron beam source with a plasma hollow cathode has been developed which is intended for the production of nanosecond electron beams with a high repetition rate. The source lifetime is over 10/sup 9/ shots. To reduce the operating pressure and shorten the time required for the formation of plasma in the cathode cavity, an auxiliary triggering glow discharge with a hollow cathode is used. With an accelerating voltage of 40 keV, a pulse repetition rate of 50-1000 Hz, and a pulse duration of 100 ns, an electron beam of current up to 200 A and risetime 25 ns has been produced.