13.5 nm extreme ultraviolet emission from tin based laser produced plasma sources
13.5 nm extreme ultraviolet emission from tin based laser produced plasma sources
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DOI：
10.1063/1.2191477
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发表时间：
2006-05
影响因子：
3.2
通讯作者：
P. Hayden;A. Cummings;N. Murphy;G. O’Sullivan;P. Sheridan;J. White;P. Dunne
中科院分区：
文献类型：
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作者：
P. Hayden;A. Cummings;N. Murphy;G. O’Sullivan;P. Sheridan;J. White;P. Dunne
本文研究了靶成分和视角对锡及掺锡平面靶激光等离子体极紫外光谱的影响。用绝对校准的0.25m掠入射真空光谱仪记录了700 mJ、15 ns半峰全宽、1064 nm Nd：YAG激光脉冲产生的等离子体在9- 17 nm范围内的光谱。在13.5nm处的峰特征的形状中清楚地看到等离子体中的锡离子（SnI-SnX）的吸收的影响，同时还看到靶中的锡离子的密度影响9- 17 nm区域中的辐射水平。
An examination of the influence of target composition and viewing angle on the extreme ultraviolet spectra of laser produced plasmas formed from tin and tin doped planar targets is reported. Spectra have been recorded in the 9–17nm region from plasmas created by a 700mJ, 15ns full width at half maximum intensity, 1064nm Nd:YAG laser pulse using an absolutely calibrated 0.25m grazing incidence vacuum spectrograph. The influence of absorption by tin ions (SnI–SnX) in the plasma is clearly seen in the shape of the peak feature at 13.5nm, while the density of tin ions in the target is also seen to influence the level of radiation in the 9–17nm region.