Controlling three-dimensional optical fields via inverse Mie scattering

Controlling three-dimensional optical fields via inverse Mie scattering
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DOI:
10.1126/sciadv.aax4769
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发表时间:
2019-10
期刊:
影响因子:
13.6
通讯作者:
A. Zhan;R. Gibson;James E. M. Whitehead;Evan M. Smith;J. Hendrickson;A. Majumdar
A. Zhan;R. Gibson;James E. M. Whitehead;Evan M. Smith;J. Hendrickson;A. Majumdar
中科院分区:
综合性期刊1区
文献类型:
--
作者:
A. Zhan;R. Gibson;James E. M. Whitehead;Evan M. Smith;J. Hendrickson;A. Majumdar

文献摘要

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我们报告了一种设计方法,可以产生一个阵列的波长尺度的球体产生指定的三维光场图案。利用离散介质散射体阵列控制三维光场的传播是一个活跃的研究领域。这些阵列可以创建具有传统光学中无法实现的功能的光学元件。在这里,我们提出了一个反设计方法的基础上的反米氏散射问题产生的三维光场图案。使用这种方法,我们展示了一种设备,将1.55 μm的光聚焦成深度变化的离散螺旋图案。报道的器件使用双光子光刻法制造,占地面积为144 μ m × 144 μ m,是迄今为止最大的反向设计光子结构。这种逆向设计方法构成了设计师自由空间光学的重要一步,其中为用户指定的功能生产独特的光学元件。
We report a design method that can generate an array of wavelength-scale spheres to produce specified 3D optical field patterns. Controlling the propagation of optical fields in three dimensions using arrays of discrete dielectric scatterers is an active area of research. These arrays can create optical elements with functionalities unrealizable in conventional optics. Here, we present an inverse design method based on the inverse Mie scattering problem for producing three-dimensional optical field patterns. Using this method, we demonstrate a device that focuses 1.55-μm light into a depth-variant discrete helical pattern. The reported device is fabricated using two-photon lithography and has a footprint of 144 μm by 144 μm, the largest of any inverse-designed photonic structure to date. This inverse design method constitutes an important step toward designer free-space optics, where unique optical elements are produced for user-specified functionalities.