Quantification of characteristic parameters for the dissociation kinetics of iron–boron pairs in Czochralski silicon
Quantification of characteristic parameters for the dissociation kinetics of iron–boron pairs in Czochralski silicon
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DOI:
10.1016/j.scriptamat.2010.10.021
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发表时间:
2011-02
影响因子:
6
通讯作者:
Xiaodong Zhu;Xuegong Yu;Xiaoqiang Li;Peng Wang;Deren Yang
中科院分区:
文献类型:
--
作者:
Xiaodong Zhu;Xuegong Yu;Xiaoqiang Li;Peng Wang;Deren Yang
We have developed a new process to quantify the dissociation kinetics of iron–boron (FeB) pairs in Czochralski silicon. It is based on determining the characteristic parameters for the association kinetics of FeB pairs by low-temperature thermal activation experiments. The dissociation rates can then be derived from the equilibrium concentration and association rates of FeB pairs at elevated temperatures. Our results show an activation energy of 1.20eV and an attempt frequency of 9×1012s−1for FeB dissociation.