Time series analysis of depth profiles in multi-layered stack-film interfaces studied by near-ambient-pressure hard x-ray angle-resolved photoemission spectroscopy
Time series analysis of depth profiles in multi-layered stack-film interfaces studied by near-ambient-pressure hard x-ray angle-resolved photoemission spectroscopy
复制标题
通过近环境压力硬 X 射线角分辨光电子能谱研究的多层堆叠膜界面深度剖面的时间序列分析
DOI：
--
复制
发表时间：
2019
期刊：
影响因子：
--
通讯作者：
Kazushi Yokoyama
中科院分区：
文献类型：
--
作者：
Satoshi Toyoda;Tomoki Yamamoto;Masashi Yoshimura;Hirosuke Sumida;Susumu Mineoi;Masatake Machida;Akitaka Yoshigoe;Akira Yoshikawa;Satoru Suzuki;Kazushi Yokoyama
