Broad area electron emission from oxygen absorbed homoepitaxially grown nitrogen (N)-doped chemical vapor deposited diamond (111) surface
Broad area electron emission from oxygen absorbed homoepitaxially grown nitrogen (N)-doped chemical vapor deposited diamond (111) surface
复制标题
吸收氧的同质外延生长氮 (N) 掺杂化学气相沉积金刚石 (111) 表面的大面积电子发射
DOI:
10.1116/1.1569931
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发表时间:
2003
影响因子:
1.4
通讯作者:
A. Sawabe
中科院分区:
文献类型:
--
作者:
H. Yamaguchi;T. Mine;Y. Suzuki;K. Okano;T. Yamada;A. Sawabe
One of the clear visions of microelectronic device engineering has been to replace the thermal cathode by a “cold” emitting cathode. The main advantages of using a cold cathode are that it is smaller and consumes less energy than its thermal counterpart. For a long time the main obstacle to designing such a device was the inability of achieving a broad area low-threshold electron emission from material of interest. This study reports surprisingly broad area low-threshold emission from homoepitaxially grown N-doped chemical vapor deposited (CVD) diamond (111), which was never achieved with polycrystalline diamond. Moreover, there was a strong correlation between the oxygen absorbed site and emission site. Our results suggest a superhard, metastable planar cold cathode with a desired emission site can be obtained by homoepitaxially grown N-doped CVD diamond (111) with selective oxygen absorption.
DOI:
--
发表时间:
2001
期刊:
Applied Physics Letters 79
影响因子:
--
作者:
K.Okano;T.Yamada;A.Sawabe;S.Koizumi;J.Itoh;G.A.J.Amaratunga
通讯作者:
G.A.J.Amaratunga