Hydrogen desorption from chemical vapor deposited diamond films

Hydrogen desorption from chemical vapor deposited diamond films
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化学气相沉积金刚石膜的氢解吸

DOI:
10.1063/1.358642
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发表时间:
1995
影响因子:
3.2
通讯作者:
R. Stulen
R. Stulen
中科院分区:
物理与天体物理3区
文献类型:
--
作者:
M. Schulberg;C. Fox;G. Kubiak;R. Stulen

文献摘要

被引文献

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采用程序升温脱附技术研究了氢及其同位素在化学气相沉积金刚石表面的脱附动力学。考虑到样品的多晶性质,解吸光谱令人惊讶地简单,对于6 K/s的加热速率,在1300 K处呈现单峰。解吸没有同位素效应,峰的最大值的位置和峰宽都不随氢覆盖度的增加而改变。达到的最大表面覆盖率约为一个单层。光谱可以用单峰一级解吸模型表示,得到的动力学参数为Ea=51 kcal/mol和ν=5×107 s−1。另一个具有高斯分布的多个解吸位点的模型给出了动力学参数Ea,平均值=82 kcal/mol,ν=9×1012 s−1,σ(高斯分布的宽度)=3 kcal/mol。与低指数天然金刚石表面的解吸进行了比较。
Temperature programmed desorption was used to measure the desorption kinetics of hydrogen and its isotopes from chemical vapor deposited diamond surfaces. The desorption spectra are surprisingly simple considering the polycrystalline nature of the sample, exhibiting a single peak at ∼1300 K for a heating rate of 6 K/s. There is no isotope effect to the desorption, and neither the position of the peak maximum nor the peak width change with increasing hydrogen coverage. The maximum surface coverage achieved is approximately one monolayer. The spectra can be represented by a single peak first order desorption model, yielding kinetic parameters of Ea=51 kcal/mol and ν=5×107 s−1. An alternate model of multiple desorption sites with a Gaussian‐distributed population gives kinetic parameters of Ea,mean=82 kcal/mol, ν=9×1012 s−1, and σ (the width of the Gaussian distribution)=3 kcal/mol. A comparison to desorption from low‐index natural diamond surfaces is presented.