Growth of Vanadium and Vanadium Oxide on a Rh(110) Surface
Growth of Vanadium and Vanadium Oxide on a Rh(110) Surface
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钒和氧化钒在 Rh(110) 表面上的生长
DOI：
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发表时间：
2017
期刊：
影响因子：
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通讯作者：
R. Imbihl
中科院分区：
文献类型：
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作者：
B. Boehn;T. Menteş;A. Locatelli;A. Sala;R. Imbihl
利用低能电子衍射（LEED）、低能电子显微镜（LEEM）、俄格电子能谱（AES）和x射线光电子能谱（XPS）研究了钒和氧化钒在Rh（110）表面的外延生长。在370 ~ 770 K的温度下，共沉积了6层V/VOx单层膜。对于V沉积，观察到n = 2和4的（1 × n）和（n × 1）覆盖层。对于3 MLE VOx的沉积，得到了一个（12 × 1）的稳定结构。v2p3 /2的XPS显示同时存在氧化和金属或强还原（V2+） V组分。
We have studied the epitaxial growth of thin layers of vanadium and vanadium oxide on a Rh(110) surface with low-energy electron diffraction (LEED), low-energy electron microscopy (LEEM), Auger electron spectroscopy (AES), and X-ray photoelectron spectroscopy (XPS). Up to six monolayers of V/VOx were deposited with temperatures varying between 370 and 770 K. For V deposition, (1 × n) and (n × 1) overlayers with n = 2 and 4 are observed. For the deposition of 3 MLE of VOx, a (12 × 1) structure is obtained as a stable structure. XPS of V 2p3/2 reveals the simultaneous presence of an oxidic and a metallic or strongly reduced (V2+) V component.