Electron induced nanodeposition of tungsten using field emission scanning and transmission electron microscopes
Electron induced nanodeposition of tungsten using field emission scanning and transmission electron microscopes
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DOI：
10.1116/1.1688349
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发表时间：
2004-03-01
影响因子：
1.4
通讯作者：
Furuya, K
中科院分区：
文献类型：
--
作者：
Shimojo, M;Mitsuishi, K;Furuya, K
电子束诱导化学气相沉积（EBI-CVD）是制备纳米纤维的最有前途的方法之一。EBI-CVD通常在传统的扫描电子显微镜中进行，并且沉积物的最小尺寸在20和300 nm之间的范围内。在这项研究中，场发射枪扫描电子显微镜（FE-SEM）和场发射枪透射电子显微镜（FE-TEM）与气体引入系统用于沉积使用W（CO）（6）前体，以减少沉积物的尺寸。使用FE-SEM产生直径为15-20 nm的点。这些点主要由钨和少量的碳和氧组成。通过使用FE-TEM，可以将点的直径减小到3.5nm。讨论了探针尺寸与点直径的关系。还通过扫描FE-TEM中的束位置来制造直径为8 nm的棒。FE-TEM产生的沉积物比常规电子显微镜产生的沉积物小。(C)2004年美国真空学会。
Electron beam induced chemical vapor deposition (EBI-CVD) is one of the promising methods for nanofabrication. EBI-CVD has generally been carried out in conventional scanning electron microscopes and the minimum size of the deposits was in the range between 20 and 300 nm. In this study, a field emission gun scanning electron microscope (FE-SEM) and a field emission gun transmission electron microscope (FE-TEM) with gas introduction systems were employed for deposition using a W(CO)(6) precursor in order to reduce the size of deposits. Dots, 15-20 nm in diameter, were produced using the FE-SEM. The dots consist mainly of tungsten with small amounts of carbon and oxygen. By using the FE-TEM, the diameter of the dots can be reduced to 3.5 nm. The relationship between probe size and dot diameter is discussed. Rods, the diameter of which was 8 nm, were also fabricated by scanning the beam position in the FE-TEM. Deposits produced by FE-TEM are smaller than those by conventional electron microscopes. (C) 2004 American Vacuum Society.