Metal mask fabrication with an inkjet printer for AWG phase trimming using a photosensitive refractive index change
Metal mask fabrication with an inkjet printer for AWG phase trimming using a photosensitive refractive index change
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DOI：
10.1109/lpt.2004.842788
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发表时间：
2005-04
影响因子：
2.6
通讯作者：
K. Takada;Y. Takada;A. Yokota;S. Satoh
中科院分区：
文献类型：
--
作者：
K. Takada;Y. Takada;A. Yokota;S. Satoh
本文报道了一种用湿法蚀刻制作金属掩模的简单方法，该方法利用光致折射率变化来减少阵列波导光栅（AWGs）的相邻串扰。该工艺利用了市售的喷墨打印机和复印机，因此制作的窗口图案的分辨率不是很高。然而，制作的掩模使我们能够大大减少相邻串扰，因为它完全依赖于AWG相位误差分布中缓慢变化的分量。
We report a simple method for fabricating a metal mask with wet etching designed to reduce the adjacent crosstalk of arrayed-waveguide gratings (AWGs) by using a photoinduced refractive index change. This process utilizes a commercially available inkjet printer and a copy machine, and so the resolution of the fabricated window pattern is not very high. However, the fabricated mask enables us to achieve a great reduction in adjacent crosstalk because it depends solely on a slowly varying component in the phase error distribution of an AWG.