Laser-Inscribed Stress-Induced Birefringence of Sapphire
Laser-Inscribed Stress-Induced Birefringence of Sapphire
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DOI：
10.3390/nano9101414
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发表时间：
2019-10-01
期刊：
影响因子：
5.3
通讯作者：
Sun, Hong-Bo
中科院分区：
文献类型：
--
作者：
Fan, Hua;Ryu, Meguya;Sun, Hong-Bo
在100 μ m的横截面区域内显示出3 × 10（-3）的BiBi-Nd：YAG晶体，该区域由轴向拉伸的贝塞尔光束状fs激光脉冲沿蓝宝石内的c轴沿着雕刻。使用轴向延伸为30-40 μ m的拉伸光束，可以在中可见光谱范围（绿色）获得高双折射和λ/4的延迟。激光写入条件的选择保证了不形成自组织纳米光栅。该方法可用于偏振光学元件的制作和用于光学涡旋产生的空间变化双折射图案的制作。
Birefringence of 3 x 10(-3) is demonstrated inside cross-sectional regions of 100 mu m, inscribed by axially stretched Bessel-beam-like fs-laser pulses along the c-axis inside sapphire. A high birefringence and retardance of lambda/4 at mid-visible spectral range (green) can be achieved using stretched beams with axial extension of 30-40 mu m. Chosen conditions of laser-writing ensure that there are no formations of self-organized nano-gratings. This method can be adopted for creation of polarization optical elements and fabrication of spatially varying birefringent patterns for optical vortex generation.