Roughness Measurement of X-Ray Mirror Surfaces
Roughness Measurement of X-Ray Mirror Surfaces
复制标题
X 射线镜面的粗糙度测量
DOI：
10.1143/jjap.25.1292
复制
发表时间：
1986
影响因子：
1.5
通讯作者：
K. Yamashita
中科院分区：
文献类型：
--
作者：
H. Kunieda;S. Hayakawa;T. Hirano;T. Kii;F. Nagase;N. Sato;Y. Tawara;F. Makino;K. Yamashita
为了制造一种x射线镜面望远镜，我们利用x射线散射技术研究了镜面的粗糙度。我们用Al-K （8.34Å） x射线测量了平板玻璃的散射剖面。利用x射线散射角分布揭示了表面粗糙度的光谱结构。这些材料（除金蒸发表面外）表面高度分布的功率谱密度函数用幂律谱表示，幂指数范围为-1 ~ -2。从幂律谱中得到的波长范围内的均方根高度为1.8-8.3Å。用这种方法得到的结果与普通光学轮廓仪的结果一致。
In order to fabricate an X-ray mirror telescope, we investigated the roughness of mirror surfaces using X-ray scattering. With Al-K (8.34Å) X-rays we measured the scattering profiles of plate glass. The spectral structure of surface roughness was revealed by the angular distribution of the X-ray scattering. The power spectral density functions of the surface-height distribution for these materials (except for a gold evapolated surface) were represented by the power-law spectra with power indices ranging from -1 to -2. The rms heights were derived to be 1.8-8.3Å for a wavelength range as expected from the power-law spectrum. The results obtained with this method were found to be consistent with those with an ordinary optical profilometer.