Generation of Air Microplasma Jet and Its Application to Local Etching of Polyimide Films
Generation of Air Microplasma Jet and Its Application to Local Etching of Polyimide Films
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DOI：
10.1143/jjap.45.5618
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发表时间：
2005
影响因子：
1.5
通讯作者：
H. Yoshiki
中科院分区：
文献类型：
--
作者：
H. Yoshiki
在空气流速为0.3 - 1.0升/分钟、射频（13.56兆赫）功率为4 - 14瓦的条件下，在外径为0.4 - 0.7毫米的不锈钢手术针尖端产生了一种空气微等离子体射流（空气μ - PJ），其中空气μ - PJ在大气压下运行时不会产生电弧放电。该针既作为通电电极，又作为狭窄的气体喷嘴。峰 - 峰电压Vpp为1.5 - 1.7千伏，等离子体辐照点（直径<1毫米）的温度为70 - 160℃。空气μ - PJ被应用于厚度为0.025毫米的聚酰亚胺薄膜的局部蚀刻。使用直径为0.4毫米的针状电极，在射频功率为8瓦时，获得了约5微米/秒的聚酰亚胺蚀刻速率。蚀刻机制不是基于热效应，而是基于氧原子的化学反应。此外，还展示了对涂覆在铜绕组线（直径<0.25毫米）上的聚酰胺 - 酰亚胺绝缘膜的局部去除，并且在射频功率为7瓦、等离子体辐照时间为5 - 20秒时，实现了绝缘膜对铜线的良好选择性。
An air microplasma jet (air µ-PJ) was generated at the tip of a stainless steel surgical needle with outer diameters of 0.4–0.7 mm at air flow rates of 0.3–1.0 l/min and RF (13.56 MHz) powers of 4–14 W, in which the air µ-PJ was operated without generating arc discharge at atmospheric pressure. The needle acts as both a powered electrode and a narrow gas nozzle. The peak-to-peak voltages Vpp were 1.5–1.7 kV and the temperatures of the plasma-irradiated spot (φ<1 mm) were 70–160 °C. The air µ-PJ was applied to the local etching of polyimide films with a thickness of 0.025 mm. A polyimide etch rate of approximately 5 µm/s was attained using a 0.4-mm-φ needle electrode at a RF power of 8 W. The etching mechanism was not based on a thermal effect but on a chemical reaction of oxygen atoms. Furthermore, the local removal of a polyamide–imide insulator film coated on a copper winding wire (φ<0.25 mm) was demonstrated and a good selectivity of the insulator film to a copper wire was achieved at a RF power of 7 W and plasma irradiation times of 5–20 s.