THE INFLUENCE OF THE HAIR CYCLE ON THE THICKNESS OF MOUSE SKIN
THE INFLUENCE OF THE HAIR CYCLE ON THE THICKNESS OF MOUSE SKIN
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DOI：
10.1002/ar.1092100404
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发表时间：
1984-01-01
影响因子：
--
通讯作者：
CHARLES, MW
中科院分区：
文献类型：
--
作者：
HANSEN, LS;COGGLE, JE;CHARLES, MW
这项研究是由于需要了解表皮和毛囊的基底细胞的真实位置，因为这些细胞是各种皮肤反应的重要“危险细胞”，包括辐射后的癌症发生。文献中几乎没有可靠的数据，以前的大多数报告都忽略了皮肤因其自然弹性而发生的收缩。在不同皮肤层的毛发周期的休止期--端原中，小鼠两侧皮肤的测定值分别为：表皮10µm，真皮250µm，脂肪层150µm。和毛囊深度150µm。化学脱毛后三天，毛囊进入活跃周期(生长期)，表皮厚度增加一倍，保持在这个值7天，然后逐渐恢复到18天的端粒值。真皮层和脂肪层也显著增加，达到.apprx。390µm和.apprx。到第10天分别为260微米，然后从第15天起返回到控制值。毛囊深度的变化更为显著，活跃的毛囊基底细胞达到.apprx。在第7-15天进入脂肪层450-550微米。化学脱毛不会影响皮肤的端原厚度。脱毛前和脱毛后即刻的表皮和真皮的端粒值与23天后下一个端粒期开始时的端粒值相似。
This study was prompted by the need to know the true position of basal cells of the epidermis and hair follicles as these are important "cells at risk" for a variety of skin reactions including carcinogenesis following exposure to radiation. There is little reliable data in the literature and most previous reports have ignored the shrinkage of skin that occurs because of its natural elasticity. The values determined for mouse flank skin in telogen, the resting phase of the hair cycle for the different skin layers, are epidermis 10 .mu.m, corium 250 .mu.m, adipose layer 150 .mu. and hair follicle depth 150 .mu.m. Three days after chemical depilation which triggers the hair follicles into active cycle (anagen) the epidermis doubles in thickness, remains at this value for 7 days, and then gradually returns to telogen values by day 18. The corium and adipose layers also increase significantly to reach .apprx. 390 .mu.m and .apprx. 260 .mu.m, respectively, by day 10 and then return to control values from day 15 onward. The change in hair follicle depths are more dramatic with active follicle basal cells reaching .apprx. 450-550 .mu.m into the adipose layer between days 7 and 15. Chemical depilation does not affect the telogen thickness of skin. The telogen values for the epidermis and dermis immediately prior to and immediately after depilation were similar to those 23 days later at the beginning of the next telogen phase.