Ion beam induced surface patterns due to mass redistribution and curvature-dependent sputtering
Ion beam induced surface patterns due to mass redistribution and curvature-dependent sputtering
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由于质量重新分布和曲率相关溅射而导致的离子束诱导表面图案
DOI：
10.1103/physrevb.86.235414
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发表时间：
2012
影响因子：
3.7
通讯作者：
Hans Hofsäss
中科院分区：
文献类型：
--
作者：
Omar Bobes;Kun Zhang;Hans Hofsäss
最近，据报道，离子诱导的质量再分布将单独决定离子辐照表面上的纳米图案的形成。我们研究了能量在200 eV和10 keV之间的负离子辐照非晶碳薄膜的图形形成。溅射产率以及碰撞级联内的位移数变化强烈的离子能量的函数，并允许我们调查的贡献曲率依赖的侵蚀根据布拉德利-哈珀模型以及质量再分配根据卡特-维什尼亚科夫模型。我们发现平行的涟漪取向的离子入射角为60°和所有的能量。对于1 keV和10 keV之间的能量，在80°附近发生向垂直图案取向或相当平坦的表面的转变。我们的结果进行了比较计算的基础上，这两个模型。对于计算，我们提取Sigmund的能量椭球的形状和大小（参数，σ，μ），角度依赖的溅射产率，和平均质量再分布距离从蒙特卡洛模拟与程序SDTrimSP。计算的曲率系数和描述表面高度演化的结果表明，在整个能区中，质量再分布是平行斑图形成的主要原因。此外，平行图案取向开始消失的角度与曲率相关溅射有关。此外，我们调查的情况下，200 eV的Ne离子，质量再分配消失的Pt侵蚀。在这种情况下，我们观察到垂直涟漪取向根据曲率依赖溅射和预测的布拉德利-哈珀模型。
Recently it was reported that ion-induced mass redistribution would solely determine nano pattern formation on ion-irradiated surfaces. We investigate the pattern formation on amorphous carbon thin films irradiated with Xe ions of energies between 200 eV and 10 keV. Sputter yield as well as number of displacements within the collision cascade vary strongly as function of ion energy and allow us to investigate the contributions of curvature-dependent erosion according to the Bradley-Harper model as well as mass redistribution according to the Carter-Vishnyakov model. We find parallel ripple orientations for an ion incidence angle of 60° and for all energies. A transition to perpendicular pattern orientation or a rather flat surface occurs around 80° for energies between 1 keV and 10 keV. Our results are compared with calculations based on both models. For the calculations we extract the shape and size of Sigmund's energy ellipsoid (parameters, σ, μ), the angle-dependent sputter yield, and the mean mass redistribution distance from the Monte Carlo simulations with program SDTrimSP. The calculated curvature coefficientsanddescribing the height evolution of the surface show that mass redistribution is dominant for parallel pattern formation in the whole energy regime. Furthermore, the angle where the parallel pattern orientation starts to disappear is related to curvature-dependent sputtering. In addition, we investigate the case of Pt erosion with 200 eV Ne ions, where mass redistribution vanishes. In this case, we observe perpendicular ripple orientation in accordance with curvature-dependent sputtering and the predictions of the Bradley-Harper model.