SU8 inverted-rib waveguide Bragg grating filter.

SU8 inverted-rib waveguide Bragg grating filter.
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DOI:
10.1364/ao.52.005545
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发表时间:
2013-08
期刊:
影响因子:
1.9
通讯作者:
Cheng-Sheng Huang;Wei-Chih Wang
Cheng-Sheng Huang;Wei-Chih Wang
中科院分区:
工程技术4区
文献类型:
--
作者:
Cheng-Sheng Huang;Wei-Chih Wang

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提出了一种采用反应离子蚀刻(RIE)和溶剂辅助微接触成型(SAMIM)技术制备的聚合物SU8倒肋波导布拉格光栅滤波器。SAMIM是一种软光刻技术。该技术的独特之处在于使用复合硬聚二甲基硅氧烷/聚二甲基硅氧烷压印将光栅图案转移到倒置SU8肋波导系统上。复合光栅图章可多次重复使用而不降解。采用这种压印和反肋波导结构,可以大大简化布拉格光栅滤波器的制作。实验结果表明,在宽度为6.6 μm,高度为4 μm的倒肋波导上,周期为0.492 μm的光栅在1550 nm处的透射光谱衰减值为-7 dBm。
A polymeric SU8 inverted-rib waveguide Bragg grating filter fabricated using reactive ion etching (RIE) and solvent assisted microcontact molding (SAMIM) is presented. SAMIM is one kind of soft lithography. The technique is unique in that a composite hard-polydimethysiloxane/polydimethysiloxane stamp is used to transfer the grating pattern onto an inverted SU8 rib waveguide system. The composite grating stamp can be used repeatedly several times without degradation. Using this stamp and inverter-rib waveguide structure, the Bragg grating filter fabrication can be significantly simplified. The experiment result shows an attenuation dip in the transmission spectra, with a value of -7 dBm at 1550 nm for a grating with a period of 0.492 μm on an inverted-rib waveguide with 6.6 μm width and 4 μm height.