Comb-drive III-nitride micro mirror fabricated by fast atom beam etching
Comb-drive III-nitride micro mirror fabricated by fast atom beam etching
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DOI：
10.1109/transducers.2011.5969494
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发表时间：
2011-06
期刊：
影响因子：
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通讯作者：
Y. Wang;T. Sasaki;T. Wu;F. Hu;K. Hane
中科院分区：
文献类型：
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作者：
Y. Wang;T. Sasaki;T. Wu;F. Hu;K. Hane
我们在这里报告的梳状驱动器III族氮化物微镜的III族氮化物/硅平台上的制造。硅衬底首先从背面图案化，并通过深反应离子蚀刻（DRIE）去除。III族氮化物微结构通过背侧对准技术限定在独立的III族氮化物板上，并通过快速原子束（FAB）蚀刻产生。所制备的梳状驱动III族氮化物微镜可以在高电阻率硅衬底上工作，而无需引入额外的隔离层。在旋转实验中对旋光角进行了实验表征。这项工作开辟了在III族氮化物/硅平台上生产III族氮化物光学微机电系统（MEMS）器件的可能性。
We report here the fabrication of comb drive III-nitride micro mirror on an III-nitride/silicon platform. Silicon substrate is first patterned from the backside and removed by deep reactive ion etching (DRIE). III-nitride microstructures are defined on freestanding III-nitride slab by backside alignment technique and generated by fast atom beam (FAB) etching. The fabricated comb-drive III-nitride micro mirrors can operate on high resistivity silicon substrate without introducing additional isolation layer. The optical rotation angles are experimentally characterized in the rotation experiments. This work opens the possibility for producing III-nitride optical micro-electro-mechanical-system (MEMS) devices on an III-nitride/silicon platform.